Open AccessMultilayer silicon rich oxy-nitride films characterization by SIMS, VASE and AFM
Author(s) -
M. Barozzi,
L. Vanzetti,
Erica Iacob,
M. Bersani,
M. Anderle,
G. Pucker,
C. Kompocholis,
Mher Ghulinyan,
P. Bellutti
Publication year - 2008
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/100/1/012016
Subject(s) - characterization (materials science) , silicon nitride , materials science , atomic force microscopy , nitride , silicon , chemical engineering , optoelectronics , nanotechnology , layer (electronics) , engineering