Open AccessEffect of varying N2 pressure on DC arc plasma properties and microstructure of TiAlN coatings
Author(s) -
Bilal Syed,
Tun-Wei Hsu,
Ana B. B. Chaar,
P. Polcik,
S. Kolozsvári,
G. Håkansson,
Johanna Rosén,
Lars Johnson,
Igor Zhirkov,
Jonathan Andersson,
Mats J. Jöesaar,
Magnus Odén
Publication year - 2020
Publication title -
plasma sources science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 108
eISSN - 1361-6595
pISSN - 0963-0252
DOI - 10.1088/1361-6595/abaeb4
Subject(s) - microstructure , plasma , cathodic protection , arc (geometry) , cathode , cathodic arc deposition , materials science , deposition (geology) , electric arc , coating , texture (cosmology) , direct current , ion , plasma arc welding , metallurgy , analytical chemistry (journal) , chemistry , composite material , electrode , anode , thermodynamics , sediment , mathematics , artificial intelligence , image (mathematics) , computer science , biology , paleontology , geometry , chromatography , quantum mechanics , welding , physics , organic chemistry , power (physics)
Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure of deposited coatings are essential for a comprehensive understanding of the DC cathodic arc deposition process. In this study we have probed the plasma, generated by DC arc on a Ti-50 at.% Al cathode in a N 2 ambience, at the growth front of the TiAlN coating. Several consequences of an increasing N 2 pressure are observed, including a decreased electron temperature, an increased electron density, and a loss of energetic ions. As a result, the preferred growth texture switches from 220 to 111. It is also observed that neutrals in the plasma can significantly contribute to the growth of TiAlN coatings.