Open AccessFast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing
Author(s) -
Colin Rawlings,
Yu Kyoung Ryu,
M. Rüegg,
Nolan Lassaline,
Christian Schwemmer,
Urs Duerig,
Armin W. Knoll,
Z. A. K. Durrani,
Chen Wang,
Dixi Liu,
Mervyn Jones
Publication year - 2018
Publication title -
nanotechnology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.926
H-Index - 203
eISSN - 1361-6528
pISSN - 0957-4484
DOI - 10.1088/1361-6528/aae3df
Subject(s) - materials science , optoelectronics , silicon , lithography , laser , quantum dot , transistor , electron beam lithography , fabrication , silicon on insulator , nanotechnology , resist , optics , layer (electronics) , medicine , physics , alternative medicine , quantum mechanics , voltage , pathology
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