Open AccessPresent and new frontiers in materials research by ambient pressure x-ray photoelectron spectroscopy
Author(s) -
Joachim Schnadt,
Jan Knudsen,
Niclas Johansson
Publication year - 2020
Publication title -
journal of physics. condensed matter
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.908
H-Index - 228
eISSN - 1361-648X
pISSN - 0953-8984
DOI - 10.1088/1361-648x/ab9565
Subject(s) - x ray photoelectron spectroscopy , chemical vapor deposition , ambient pressure , thin film , atomic layer deposition , nanotechnology , deposition (geology) , materials science , catalysis , analytical chemistry (journal) , chemical engineering , chemistry , engineering physics , physics , environmental chemistry , engineering , organic chemistry , geology , paleontology , sediment , thermodynamics
In this topical review we catagorise all ambient pressure x-ray photoelectron spectroscopy publications that have appeared between the 1970s and the end of 2018 according to their scientific field. We find that catalysis, surface science and materials science are predominant, while, for example, electrocatalysis and thin film growth are emerging. All catalysis publications that we could identify are cited, and selected case stories with increasing complexity in terms of surface structure or chemical reaction are discussed. For thin film growth we discuss recent examples from chemical vapour deposition and atomic layer deposition. Finally, we also discuss current frontiers of ambient pressure x-ray photoelectron spectroscopy research, indicating some directions of future development of the field.