Open AccessSputtered Au–Ta films with tunable electrical resistivity
Author(s) -
L. B. Bayu Aji,
A. M. Engwall,
J. H. Bae,
Alexander A. Baker,
Jacob L. Beckham,
S. J. Shin,
Xavier Lepró,
S. McCall,
J. D. Moody,
S. O. Kucheyev
Publication year - 2020
Publication title -
journal of physics d applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.857
H-Index - 198
eISSN - 1361-6463
pISSN - 0022-3727
DOI - 10.1088/1361-6463/abc501
Subject(s) - materials science , hohlraum , electrical resistivity and conductivity , alloy , tantalum , sputtering , sputter deposition , substrate (aquarium) , nanoindentation , optoelectronics , composite material , thin film , optics , nanotechnology , metallurgy , laser , electrical engineering , oceanography , physics , geology , engineering
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