Open AccessInfluence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
Author(s) -
Ruben Alcala,
Claudia Richter,
Monica Materano,
Patrick D. Lomenzo,
Chuanzhen Zhou,
Jacob L. Jones,
Thomas Mikolajick,
Uwe Schroeder
Publication year - 2020
Publication title -
journal of physics d applied physics
Language(s) - English
Resource type - Journals
eISSN - 1361-6463
pISSN - 0022-3727
DOI - 10.1088/1361-6463/abbc98
Subject(s) - ferroelectricity , materials science , oxygen , crystallography , analytical chemistry (journal) , nanotechnology , optoelectronics , chemistry , dielectric , environmental chemistry , organic chemistry
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