Open AccessMethod for controlling stress gradients in PVD aluminum nitride
Author(s) -
Katherine E. Knisely,
Bram Hunt,
Brian Troelsen,
E Douglas,
Benjamin A. Griffin,
J. Stevens
Publication year - 2018
Publication title -
journal of micromechanics and microengineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.494
H-Index - 132
eISSN - 1361-6439
pISSN - 0960-1317
DOI - 10.1088/1361-6439/aad91a
Subject(s) - residual stress , materials science , stress (linguistics) , substrate (aquarium) , radio frequency , deposition (geology) , nitride , silicon nitride , aluminium , thin film , blanket , rf power amplifier , silicon , composite material , optoelectronics , nanotechnology , electrical engineering , layer (electronics) , paleontology , amplifier , philosophy , linguistics , oceanography , engineering , cmos , sediment , biology , geology
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