Anion diffusion in two-dimensional halide perovskites
Author(s) -
Akriti Akriti,
ZihYu Lin,
Jee Yung Park,
Hanjun Yang,
Brett M. Savoie,
Letian Dou
Publication year - 2022
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0088538
Subject(s) - halide , materials science , diffusion , ionic bonding , heterojunction , perovskite (structure) , dissociation (chemistry) , semiconductor , lattice diffusion coefficient , nanotechnology , chemical physics , vacancy defect , ion , optoelectronics , inorganic chemistry , chemistry , crystallography , effective diffusion coefficient , thermodynamics , physics , medicine , organic chemistry , radiology , magnetic resonance imaging
Commercialization of halide perovskites in the semiconductor industry is hindered by their short-term stability. The instability of perovskites is closely interlinked with ionic diffusion. Historically, attempts to study diffusion in 2D perovskites mostly utilized electrical characterizations, but these characterizations pose a challenge in deconvoluting the impact of device architecture, interlayers, and ionic species. In this Perspective, we focus our attention on simple optical characterizations employed in the literature to investigate halide diffusion in 2D perovskites using lateral and vertical heterostructure platforms. We review the various synthesis techniques used for fabrication of halide perovskite heterostructures and discuss the qualitative and quantitative diffusion studies performed using these platforms. We discuss the numerical methods used to validate and supplement the experimental halide diffusion kinetics. Finally, we highlight the need to conduct further research on the impact of device operating conditions, lattice structure, and vacancy concentration on halide diffusion. Through this Perspective, we aim to emphasize the need of developing a comprehensive understanding of halide diffusion in perovskites for their successful deployment in optoelectronics.
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