Study of recrystallization and activation processes in thin and highly doped silicon-on-insulator layers by nanosecond laser thermal annealing | Zendy

Nicolas Chery | Zendy; M. Zhang | Zendy; Richard Monflier | Zendy; Nicolas Mallet | Zendy; G. Seine | Zendy; Vincent Paillard | Zendy; J. M. Poumirol | Zendy; Guilhem Larrieu | Zendy; A.S. Royet | Zendy; S. Kerdilès | Zendy; P. Acosta-Alba | Zendy; Michele Perego | Zendy; C. Bonafos | Zendy; F. Cristiano | Zendy

Open Access

Study of recrystallization and activation processes in thin and highly doped silicon-on-insulator layers by nanosecond laser thermal annealing

Author(s) -

Nicolas Chery,

M. Zhang,

Richard Monflier,

Nicolas Mallet,

G. Seine,

Vincent Paillard,

J. M. Poumirol,

Guilhem Larrieu,

A.S. Royet,

S. Kerdilès,

P. Acosta-Alba,

Michele Perego,

C. Bonafos,

F. Cristiano

Publication year - 2022

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/5.0073827

Subject(s) - materials science , recrystallization (geology) , annealing (glass) , silicon , nucleation , doping , hillock , thin film , dopant , silicon on insulator , surface roughness , ion implantation , optoelectronics , analytical chemistry (journal) , composite material , nanotechnology , chemistry , paleontology , organic chemistry , biology , ion , chromatography

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