Open AccessOn the population density of the argon excited levels in a high power impulse magnetron sputtering discharge
Author(s) -
Martin Rudolph,
A. Revel,
Daniel Lundin,
N. Brenning,
M. A. Raadu,
André Anders,
Tiberiu Minea,
Jón Tómas Guðmundsson
Publication year - 2022
Publication title -
physics of plasmas
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.75
H-Index - 160
eISSN - 1089-7674
pISSN - 1070-664X
DOI - 10.1063/5.0071887
Subject(s) - high power impulse magnetron sputtering , atomic physics , excited state , physics , population , argon , ionization , ion , sputter deposition , sputtering , thin film , demography , quantum mechanics , sociology
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