Growth of highly conductive Al-rich AlGaN:Si with low group-III vacancy concentration
Author(s) -
Abdullah Almogbel,
Christian J. Zollner,
Burhan K. SaifAddin,
Michael Iza,
Jianfeng Wang,
Yifan Yao,
Michael Wang,
Humberto M. Foronda,
Igor Prozheev,
F. Tuomisto,
Abdulrahman Albadri,
Shuji Nakamura,
Steven P. DenBaars,
James S. Speck
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0066652
Subject(s) - trimethylindium , electrical resistivity and conductivity , materials science , chemical vapor deposition , silicon , conductivity , metalorganic vapour phase epitaxy , shallow donor , secondary ion mass spectrometry , impurity , analytical chemistry (journal) , condensed matter physics , ion , optoelectronics , chemistry , doping , epitaxy , nanotechnology , layer (electronics) , physics , engineering , organic chemistry , chromatography , electrical engineering
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