Open AccessMolybdenum carbonitride deposited by plasma atomic layer deposition as a Schottky contact to gallium nitride
Author(s) -
Alex Molina,
Ian E. Campbell,
Timothy N. Walter,
Ama D. Agyapong,
Suzanne E. Mohney
Publication year - 2021
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/5.0062140
Subject(s) - materials science , x ray photoelectron spectroscopy , work function , molybdenum , analytical chemistry (journal) , gallium nitride , schottky barrier , gallium , nitride , atomic layer deposition , annealing (glass) , thin film , layer (electronics) , optoelectronics , diode , nanotechnology , metallurgy , chemistry , chemical engineering , chromatography , engineering
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