Open AccessThermal strain analysis considering in-plane anisotropy for sputtered AlN on c- and a-plane sapphire under high-temperature annealing
Author(s) -
Yusuke Hayashi,
Kenjiro Uesugi,
Kanako Shojiki,
Tetsuya Tohei,
Akira Sakai,
Hideto Miyake
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0059723
Subject(s) - materials science , sapphire , annealing (glass) , residual stress , anisotropy , wafer , diffraction , optoelectronics , composite material , optics , laser , physics
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