Open AccessMultiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas
Author(s) -
Patrick Vanraes,
Syam Parayil Venugopalan,
Annemie Bogaerts
Publication year - 2021
Publication title -
applied physics reviews
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.084
H-Index - 66
ISSN - 1931-9401
DOI - 10.1063/5.0058904
Subject(s) - plasma etching , plasma , etching (microfabrication) , nanotechnology , plasma processing , computer science , microelectronics , materials science , engineering physics , chemistry , physics , layer (electronics) , quantum mechanics
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