Open AccessDamage effect of hafnium oxide gate dielectric based metal–oxide–semiconductor structure under gamma-ray irradiation
Author(s) -
Man Ding,
Xin Liu
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0048080
Subject(s) - materials science , irradiation , silicon , optoelectronics , oxide , crystallinity , atomic layer deposition , analytical chemistry (journal) , thin film , chemistry , nanotechnology , composite material , physics , chromatography , nuclear physics , metallurgy
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