Open AccessIn situ microscopy for plasma erosion of complex surfaces
Author(s) -
Angelica Ottaviano,
Anirudh Thuppul,
J. T. Hayes,
Chris A. Dodson,
Gary Z. Li,
Zhitong Chen,
Richard E. Wirz
Publication year - 2021
Publication title -
review of scientific instruments online/review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/5.0043002
Subject(s) - materials science , plasma , profilometer , dense plasma focus , optics , plasma cleaning , resolution (logic) , argon , microscope , microscopy , surface roughness , composite material , physics , atomic physics , computer science , quantum mechanics , artificial intelligence