Open AccessThe discharge selectivity in an atmospheric pressure helium–argon dielectric barrier discharge
Author(s) -
W. G. Huo,
X. Li,
Jingsong LIN,
Ying Guo,
Y. X. Wang,
Yang Xia,
Min Zhang
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0041578
Subject(s) - argon , dielectric barrier discharge , helium , atmospheric pressure , electrode , materials science , spectral line , analytical chemistry (journal) , dielectric , partial discharge , plasma cleaning , atomic physics , chemistry , voltage , plasma , optoelectronics , electrical engineering , oceanography , physics , engineering , chromatography , astronomy , quantum mechanics , geology
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