Open AccessThe effect of H radicals on microstructure and electrical and optical properties of sputtered ZnO:Al films
Author(s) -
Changshan Hao,
Jingjing Peng,
Yanli Zhong,
Xuan Zhang,
Pei Lei,
Zhongqi Huo
Publication year - 2021
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0041307
Subject(s) - radical , materials science , x ray photoelectron spectroscopy , raman spectroscopy , amorphous solid , sputter deposition , microstructure , analytical chemistry (journal) , grain boundary , sputtering , band gap , thin film , chemical engineering , nanotechnology , crystallography , chemistry , metallurgy , optoelectronics , optics , organic chemistry , physics , engineering
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