Open AccessFerroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on silicon
Author(s) -
Jaidah Mohan,
Heber Hernández-Arriaga,
Yong Chan Jung,
Takashi Onaya,
ChangYong Nam,
Esther H. R. Tsai,
Si Joon Kim,
Jiyoung Kim
Publication year - 2021
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/5.0035579
Subject(s) - ferroelectricity , materials science , capacitor , polarization (electrochemistry) , silicon , optoelectronics , coercivity , capacitance , electrode , dielectric , analytical chemistry (journal) , condensed matter physics , voltage , electrical engineering , chemistry , physics , engineering , chromatography
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