Open AccessPhotoresist as a choice of molecularly thin gate dielectrics in graphene-based devices
Author(s) -
Minmin Zhou,
Dehui� Zhang,
Dakuan Zhang,
Huabin Sun,
Zhe Liu,
Tianhong Chen,
Che-Hong Liu,
Xinran Wang,
Zhaohui Zhong,
Yi Shi
Publication year - 2021
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/5.0034996
Subject(s) - materials science , photoresist , graphene , optoelectronics , dielectric , thin film , nanotechnology , fabrication , layer (electronics) , alternative medicine , medicine , pathology
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