Open AccessConcept model of atomic hydrogen dry developing process for photolithographic patterning
Author(s) -
Yuki Takemori,
Masao Gohdo,
Yuta Koda,
Hideo Horibe
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0027509
Subject(s) - photolithography , resist , dry etching , benzophenone , methyl methacrylate , fabrication , materials science , photomask , hydrogen , etching (microfabrication) , atomic layer deposition , nanotechnology , lithography , thin film , chemical engineering , layer (electronics) , photochemistry , polymer , chemistry , optoelectronics , polymerization , polymer chemistry , organic chemistry , composite material , medicine , alternative medicine , pathology , engineering
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