Open AccessEffect of SiO2 capping layer on the ferroelectricity of Hf0.5Zr0.5O2 films
Author(s) -
Minglong Zhai,
Bing Sun,
Kailiang Huang,
Hudong Chang,
Honggang Liu
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0027476
Subject(s) - ferroelectricity , annealing (glass) , materials science , polarization (electrochemistry) , layer (electronics) , thin film , optoelectronics , silicon , composite material , nanotechnology , dielectric , chemistry
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