Development of a flux-film-coated sputtering (FFC-sputtering) method for fabricating c-axis oriented AlN film
Author(s) -
Yelim Song,
Fumio Kawamura,
Kiyoshi Shimamura,
Takeshi Ohgaki,
Naoki Ohashi
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0025736
Subject(s) - sputtering , materials science , crystallinity , sapphire , nitrogen , substrate (aquarium) , cubic zirconia , sputter deposition , flux (metallurgy) , analytical chemistry (journal) , thin film , nitride , metallurgy , composite material , nanotechnology , chemistry , optics , ceramic , layer (electronics) , laser , physics , oceanography , organic chemistry , chromatography , geology
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