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Observations on intensity oscillations in reflection high-energy electron diffraction during epitaxial growth of Si(001) and Ge(001)
Author(s) -
J. Aarts,
W. M. Gerits,
P.K. Larsen
Publication year - 1986
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.96662
Subject(s) - specular reflection , electron diffraction , reflection high energy electron diffraction , molecular beam epitaxy , diffraction , reflection (computer programming) , materials science , intensity (physics) , silicon , epitaxy , substrate (aquarium) , electron , optics , condensed matter physics , optoelectronics , physics , nanotechnology , oceanography , geology , computer science , programming language , quantum mechanics , layer (electronics)

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