Open AccessTuning of Schottky barrier height using oxygen-inserted (OI) layers and fluorine implantation
Author(s) -
Xi Zhang,
Hideki Takeuchi,
Daniel Connelly,
Marek Hytha,
Robert J. Mears,
L. Rubin,
TsuJae King Liu
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5144507
Subject(s) - schottky barrier , schottky diode , x ray photoelectron spectroscopy , silicide , secondary ion mass spectrometry , oxygen , materials science , analytical chemistry (journal) , fluorine , ion implantation , silicon , diode , optoelectronics , chemistry , mass spectrometry , ion , chemical engineering , metallurgy , organic chemistry , chromatography , engineering
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