Open AccessIrradiation-induced reactions at the CeO2/SiO2/Si interface
Author(s) -
Pitambar Sapkota,
A. Aprahamian,
KwongYu Chan,
B. Frentz,
K. T. Macon,
Sylwia Ptasińska,
D. Robertson,
Khachatur V. Manukyan
Publication year - 2020
Publication title -
the journal of chemical physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.071
H-Index - 357
eISSN - 1089-7690
pISSN - 0021-9606
DOI - 10.1063/1.5142619
Subject(s) - x ray photoelectron spectroscopy , cerium oxide , cerium , carbon monoxide , irradiation , annealing (glass) , materials science , thin film , oxygen , silicon , catalysis , oxide , analytical chemistry (journal) , chemical engineering , chemistry , inorganic chemistry , nanotechnology , biochemistry , physics , organic chemistry , composite material , chromatography , nuclear physics , engineering , metallurgy
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