Open AccessFreestanding ultra-thin silica
Author(s) -
Rui Zhao,
Hongyeun Kim,
Joshua J. Stapleton,
ZiKui Liu,
Joshua A. Robinson
Publication year - 2020
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5136232
Subject(s) - materials science , silicon , substrate (aquarium) , etching (microfabrication) , wafer , chemical vapor deposition , isotropic etching , thin film , nanotechnology , chemical engineering , tellurium , optoelectronics , layer (electronics) , metallurgy , oceanography , engineering , geology
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