Open AccessPlasma charge injection technology and its application to c-Si solar cells for field-effect passivation
Author(s) -
JeongMo Hwang
Publication year - 2019
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.5087725
Subject(s) - passivation , plasma , materials science , silicon nitride , optoelectronics , plasma etching , wafer , sputtering , remote plasma , etching (microfabrication) , silicon , thin film , nanotechnology , chemical vapor deposition , physics , layer (electronics) , quantum mechanics
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