Open AccessResidual-free reactive ion etching of gold layers
Author(s) -
Gerhard Franz,
Wolfhard Oberhausen,
Ralf Meyer,
MarkusChristian Amann
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5037886
Subject(s) - reactive ion etching , etching (microfabrication) , electron cyclotron resonance , materials science , semiconductor , plasma etching , plasma , residual , ion , optoelectronics , nanotechnology , chemistry , layer (electronics) , organic chemistry , algorithm , computer science , physics , quantum mechanics
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