Open AccessPolarity inversion of AlN film grown on nitrided a-plane sapphire substrate with pulsed DC reactive sputtering
Author(s) -
Marsetio Noorprajuda,
Makoto Ohtsuka,
Hiroyuki Fukuyama
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5024996
Subject(s) - sputtering , materials science , sapphire , nitriding , thin film , nitride , substrate (aquarium) , pulsed dc , analytical chemistry (journal) , layer (electronics) , crystallography , optoelectronics , sputter deposition , optics , chemistry , laser , composite material , nanotechnology , physics , chromatography , geology , oceanography
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