z-logo
open-access-imgOpen Access
High spin polarization in epitaxial Fe4N thin films using Cr and Ag as buffer layers
Author(s) -
Hongshi Li,
Xuan Li,
Dongrin Kim,
Gejian Zhao,
Delin Zhang,
Zhitao Diao,
Tingyong Chen,
JianPing Wang
Publication year - 2018
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.5023698
Subject(s) - materials science , thin film , spintronics , ferromagnetism , spin polarization , epitaxy , condensed matter physics , sputtering , andreev reflection , optoelectronics , analytical chemistry (journal) , layer (electronics) , nanotechnology , chemistry , superconductivity , physics , quantum mechanics , chromatography , electron

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom