Open AccessHigh growth rate hydride vapor phase epitaxy at low temperature through use of uncracked hydrides
Author(s) -
Kevin L. Schulte,
Anna K. Braun,
John Simon,
Aaron J. Ptak
Publication year - 2018
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.5013136
Subject(s) - hydride , epitaxy , heterojunction , analytical chemistry (journal) , materials science , chemistry , optoelectronics , nanotechnology , metal , metallurgy , layer (electronics) , chromatography
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