Open AccessMeasurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma
Author(s) -
E. M. Hollmann,
D. Alegre,
M.J. Baldwin,
C. Chrobak,
R. Doerner,
M. Miyamoto,
D. Nishijima
Publication year - 2017
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.5002114
Subject(s) - sputtering , beryllium , materials science , helium , fluence , plasma , yield (engineering) , drop (telecommunication) , atomic physics , ion , chemistry , thin film , nanotechnology , metallurgy , nuclear physics , physics , telecommunications , organic chemistry , computer science