KF post-deposition treatment of industrial Cu(In, Ga)(S, Se)2 thin-film surfaces: Modifying the chemical and electronic structure | Zendy

Michelle Mezher | Zendy; Lorelle M. Mansfield | Zendy; Kimberly Horsley | Zendy; Monika Blum | Zendy; R. D. Wieting | Zendy; L. Weinhardt | Zendy; K. Ramanathan | Zendy; Clemens Heske | Zendy

Open Access

KF post-deposition treatment of industrial Cu(In, Ga)(S, Se)2 thin-film surfaces: Modifying the chemical and electronic structure

Author(s) -

Michelle Mezher,

Lorelle M. Mansfield,

Kimberly Horsley,

Monika Blum,

R. D. Wieting,

L. Weinhardt,

K. Ramanathan,

Clemens Heske

Publication year - 2017

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.4998445

Subject(s) - chalcopyrite , band gap , sulfur , electronic structure , thin film , deposition (geology) , materials science , electronic band structure , valence (chemistry) , conduction band , chemistry , analytical chemistry (journal) , electron , copper , nanotechnology , optoelectronics , metallurgy , condensed matter physics , computational chemistry , paleontology , physics , organic chemistry , quantum mechanics , chromatography , sediment , biology

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