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KF post-deposition treatment of industrial Cu(In, Ga)(S, Se)2 thin-film surfaces: Modifying the chemical and electronic structure
Author(s) -
Michelle Mezher,
Lorelle M. Mansfield,
Kimberly Horsley,
Monika Blum,
R. D. Wieting,
L. Weinhardt,
K. Ramanathan,
Clemens Heske
Publication year - 2017
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4998445
Subject(s) - chalcopyrite , band gap , sulfur , electronic structure , thin film , deposition (geology) , materials science , electronic band structure , valence (chemistry) , conduction band , chemistry , analytical chemistry (journal) , electron , copper , nanotechnology , optoelectronics , metallurgy , condensed matter physics , computational chemistry , paleontology , physics , organic chemistry , quantum mechanics , chromatography , sediment , biology

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