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Fabrication and efficiency measurement of a Mo/C/Si/C three material system multilayer Laue lens
Author(s) -
Adam Kubec,
J. Mäser,
Petr Formánek,
Volker Franke,
Stefan Braun,
Peter Gawlitza,
Andreas Leson,
Albert T. Macrander
Publication year - 2017
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4978610
Subject(s) - materials science , beamline , silicon , optics , lens (geology) , stack (abstract data type) , fabrication , sputter deposition , molybdenum , optoelectronics , beam (structure) , diffraction , silicide , layer (electronics) , thin film , sputtering , composite material , nanotechnology , physics , medicine , alternative medicine , pathology , computer science , metallurgy , programming language
In this letter, we report on the manufacturing of a multilayer Laue lens (MLL) consisting of a multilayer stack with three materials: molybdenum and silicon as the absorber and spacer layer, respectively, and carbon as transition layers. The design has four layers per period: Mo/C/Si/C. It yields 6000 zones and provides an aperture of 50 μm. This allows the MLL structure to accept a large portion of the coherent part of the beam and to achieve a small spot size. The MLL deposition was made by magnetron sputtering at the Fraunhofer IWS, and the sectioning was done by laser cutting and subsequent focused ion beam milling to a thickness that provides a good efficiency for a photon energy of 12 keV. The diffraction efficiency as a function of the tilting angle has been measured at beamline 1-BM of the Advanced Photon Source. An efficiency of almost 40% has been achieved. This shows that the material system performs well compared to MLLs made of two-materials and that it is in excellent agreement with the numerically calculated efficiency for a comparable molybdenum/silicon bilayer system lens. We conclude that the three material system offers high efficiencies and is advantageous for stress reduction in MLLs

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