Open AccessA comparative study on continuous and pulsed RF argon capacitive glow discharges at low pressure by fluid modeling
Author(s) -
Ruiqiang Liu,
Yue Liu,
W. Jia,
Yanwen Zhou
Publication year - 2017
Publication title -
physics of plasmas
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.75
H-Index - 160
eISSN - 1089-7674
pISSN - 1070-664X
DOI - 10.1063/1.4974762
Subject(s) - plasma , atomic physics , argon , physics , ionization , pulsed power , current (fluid) , radio frequency , capacitive sensing , diffusion , pulsed dc , plasma parameters , materials science , power (physics) , electrical engineering , ion , thermodynamics , sputter deposition , thin film , quantum mechanics , sputtering , engineering
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