Open AccessEpitaxial growth and physical properties of ternary nitride thin films by polymer-assisted deposition
Author(s) -
Erik Enriquez,
Yingying Zhang,
Aiping Chen,
Zhenxing Bi,
Yongqiang Wang,
Engang Fu,
Zachary Harrell,
Xujie Lü,
P. C. Dowden,
Haiyan Wang,
Chonglin Chen,
Q. X. Jia
Publication year - 2016
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4961880
Subject(s) - materials science , epitaxy , thin film , ternary operation , crystallinity , nitride , grain boundary , electrical resistivity and conductivity , lattice constant , optoelectronics , composite material , layer (electronics) , nanotechnology , optics , microstructure , computer science , programming language , physics , engineering , diffraction , electrical engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom