Open AccessEpitaxial strain and its relaxation at the LaAlO3/SrTiO3 interface
Author(s) -
Guozhen Liu,
Qingyu Lei,
Matthäus A. Wolak,
Qun Li,
LongQing Chen,
Christopher Winkler,
Jennifer D. Sloppy,
Mitra L. Taheri,
Xiaoxing Xi
Publication year - 2016
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4961330
Subject(s) - materials science , pulsed laser deposition , thin film , epitaxy , condensed matter physics , relaxation (psychology) , substrate (aquarium) , oxide , reciprocal lattice , layer (electronics) , stress relaxation , sheet resistance , composite material , diffraction , optics , nanotechnology , metallurgy , geology , psychology , social psychology , oceanography , physics , creep
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