Open AccessUp-down asymmetry measurement of tungsten distribution in large helical device using two extreme ultraviolet (EUV) spectrometers
Author(s) -
Y. Liu,
S. Morita,
X.L. Huang,
T. Oishi,
M. Goto,
H. M. Zhang
Publication year - 2016
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.4959781
Subject(s) - extreme ultraviolet , extreme ultraviolet lithography , emissivity , spectrometer , large helical device , asymmetry , wavelength , optics , tungsten , plasma diagnostics , materials science , ultraviolet , plasma , physics , atomic physics , laser , nuclear physics , quantum mechanics , metallurgy
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