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Impedance of an intense plasma-cathode electron source for tokamak startup
Author(s) -
E.T. Hinson,
J.L. Barr,
R. J. Fonck,
M.G. Burke,
R. J. Fonck,
J.M. Perry
Publication year - 2016
Publication title -
physics of plasmas
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.75
H-Index - 160
eISSN - 1089-7674
pISSN - 1070-664X
DOI - 10.1063/1.4952628
Subject(s) - tokamak , physics , plasma , atomic physics , cathode , current density , electron , electron density , biasing , voltage , nuclear physics , electrical engineering , quantum mechanics , engineering

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