Open AccessA kinetic model for stress generation in thin films grown from energetic vapor fluxes
Author(s) -
Eric Chason,
M. Karlson,
Jonathan Colin,
D. Magnfält,
K. Sarakinos,
G. Abadias
Publication year - 2016
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4946039
Subject(s) - materials science , thin film , sputtering , grain boundary , residual stress , stress (linguistics) , chemical vapor deposition , crystallite , sputter deposition , kinetic energy , physical vapor deposition , grain size , diffusion , surface diffusion , composite material , thermodynamics , metallurgy , chemistry , nanotechnology , microstructure , physics , linguistics , philosophy , quantum mechanics , adsorption
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