Open AccessFabrication and physical properties of [Fe/Fe4N]N multilayers with high saturation magnetization
Author(s) -
Bo Yu,
Lili Lin,
Bin Ma,
Z. Z. Zhang,
Qingyuan Jin,
Jianping Wang
Publication year - 2016
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4943241
Subject(s) - materials science , saturation (graph theory) , magnetization , sputter deposition , condensed matter physics , sputtering , epitaxy , annealing (glass) , coercivity , analytical chemistry (journal) , thin film , metallurgy , layer (electronics) , magnetic field , nanotechnology , chemistry , physics , mathematics , quantum mechanics , combinatorics , chromatography
[Fe/Fe4N]N multilayers with high saturation magnetization were prepared on MgO(200) substrate, by the DC reactive magnetron sputtering and then annealed at higher temperature. Their structural and magnetic properties were investigated. Epitaxial growth of α-Fe and γ’-Fe4N were demonstrated on MgO, and then excellent [Fe/Fe4N]N was obtained. Though the saturation magnetizations of the as-deposited [Fe/Fe4N]N are slightly below the average value of those of α-Fe and γ’-Fe4N, the saturation magnetization of the annealed [Fe(3.04 nm)/Fe4N(3.04 nm)]5 increases up to 1850 emu/cc, 32 % larger than that of α-Fe film. N atom diffusion from the γ’-Fe4N to the α-Fe layer at high temperature greatly improves the saturation magnetization