Open AccessExperimental investigation of defect-assisted and intrinsic water vapor permeation through ultrabarrier films
Author(s) -
Hyungchul Kim,
Ankit Kumar Singh,
Cheng-Yin Wang,
Canek Fuentes-Hernández,
Bernard Kippelen,
Samuel Graham
Publication year - 2016
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.4942510
Subject(s) - permeation , materials science , atomic layer deposition , barrier layer , plasma enhanced chemical vapor deposition , water vapor , layer (electronics) , diffusion barrier , chemical engineering , composite material , nanotechnology , transmission rate , chemical vapor deposition , membrane , chemistry , transmission (telecommunications) , organic chemistry , electrical engineering , biochemistry , engineering
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