Open AccessIn situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy
Author(s) -
J. H. Lee,
ICheng Tung,
Seo Hyoung Chang,
Anand Bhattacharya,
Dillon D. Fong,
J. W. Freeland,
Hawoong Hong
Publication year - 2016
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.4939100
Subject(s) - diffractometer , molecular beam epitaxy , materials science , optics , oxide , epitaxy , diffraction , optoelectronics , nanotechnology , scanning electron microscope , physics , composite material , layer (electronics) , metallurgy
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