Open AccessErratum: “An amorphous phase formation at palladium / silicon oxide (Pd/SiOx) interface through electron irradiation - electronic excitation process” [AIP Advances 5, 117145 (2015)]
Author(s) -
Takeshi Nagase,
Ryo Yamashita,
Atsushi Yabuuchi,
Jae Yong Jung
Publication year - 2015
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4938093
Subject(s) - materials science , palladium , electron beam processing , silicon , excitation , irradiation , oxide , phase (matter) , amorphous solid , optoelectronics , chemistry , metallurgy , crystallography , physics , catalysis , electrical engineering , engineering , biochemistry , organic chemistry , nuclear physics
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