Open AccessA modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes
Author(s) -
Jeffrey A. Klug,
Matthew S. Weimer,
Jonathan D. Emery,
Angel YanguasGil,
Sönke Seifert,
Christian M. Schlepütz,
Alex B. F. Martinson,
Jeffrey W. Elam,
Adam S. Hock,
Thomas Proslier
Publication year - 2015
Publication title -
review of scientific instruments online/review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.4934807
Subject(s) - atomic layer deposition , materials science , synchrotron , sapphire , characterization (materials science) , scattering , optoelectronics , optics , layer (electronics) , nanotechnology , physics , laser