Open AccessAccessing a growth window for SrVO3 thin films
Author(s) -
Matthew Brahlek,
Lei Zhang,
Craig Eaton,
Haitian Zhang,
Roman EngelHerbert
Publication year - 2015
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4932198
Subject(s) - stoichiometry , thin film , analytical chemistry (journal) , molecular beam epitaxy , electron diffraction , lattice constant , diffraction , flux (metallurgy) , materials science , electrical resistivity and conductivity , vanadium , chemistry , epitaxy , optics , nanotechnology , metallurgy , layer (electronics) , physics , electrical engineering , engineering , chromatography
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