Theoretical analysis of surface acoustic wave propagating properties of Y-cut nano lithium niobate film on silicon dioxide | Zendy

Jing Chen | Zendy; Qiaozhen Zhang | Zendy; Tao Han | Zendy; Zhou Liu | Zendy; Gongbin Tang | Zendy; Boquan Liu | Zendy; Xiaojun Ji | Zendy

Open Access

Theoretical analysis of surface acoustic wave propagating properties of Y-cut nano lithium niobate film on silicon dioxide

Author(s) -

Jing Chen,

Qiaozhen Zhang,

Tao Han,

Zhou Liu,

Gongbin Tang,

Boquan Liu,

Xiaojun Ji

Publication year - 2015

Publication title -

aip advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.421

H-Index - 58

ISSN - 2158-3226

DOI - 10.1063/1.4929774

Subject(s) - surface acoustic wave , materials science , lithium niobate , nano , rayleigh wave , substrate (aquarium) , lithium tantalate , silicon , rayleigh scattering , silicon dioxide , electrode , acoustic wave , optoelectronics , optics , surface wave , composite material , chemistry , physics , oceanography , geology

The surface acoustic wave (SAW) propagating characteristics of Y-cut nano LiNbO3 (LN) film on SiO2/LN substrate have been theoretically calculated. The simulated results showed a shear horizontal (SH) SAW with enhanced electromechanical coupling factor K2 owing to a dimensional effect of the nanoscale LN film. However, a Rayleigh SAW and two other resonances related to thickness vibrations caused spurious responses for wideband SAW devices. These spurious waves could be fully suppressed by properly controlling structural parameters including the electrode layer height, thickness, and the Euler angle (θ) of the LN thin film. Finally, a pure SH SAW was obtained with a wide θ range, from 0° to 5° and 165° to 180°. The largest K2 achieved for the pure SH SAW was about 35.1%. The calculated results demonstrate the promising application of nano LN film to the realization of ultra-wideband SAW devices

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research