Open AccessVapor-liquid-solid epitaxial growth of Si1−xGex alloy nanowires: Composition dependence on precursor reactivity and morphology control for vertical forests
Author(s) -
Sukgeun Choi,
Pradeep Manandhar,
S. T. Picraux
Publication year - 2015
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4923355
Subject(s) - disilane , nanowire , germane , nucleation , silane , alloy , materials science , epitaxy , reactivity (psychology) , vapor–liquid–solid method , chemical engineering , partial pressure , analytical chemistry (journal) , nanotechnology , chemistry , silicon , germanium , optoelectronics , metallurgy , organic chemistry , composite material , oxygen , layer (electronics) , medicine , alternative medicine , pathology , engineering
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