Open AccessOn the thermal stability of physical vapor deposited oxide-hardened nanocrystalline gold thin films
Author(s) -
Nicolas Argibay,
Jon-Erik Mogonye,
Joseph R. Michael,
Ronald S. Goeke,
Paul G. Kotula,
Thomas Scharf,
Michael Thomas Dugger,
Somuri V. Prasad
Publication year - 2015
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4915922
Subject(s) - materials science , nanocrystalline material , electrical resistivity and conductivity , grain size , grain boundary , thin film , oxide , grain growth , annealing (glass) , crystallite , activation energy , analytical chemistry (journal) , arrhenius equation , microstructure , composite material , metallurgy , nanotechnology , chemistry , chromatography , engineering , electrical engineering